Giovanni Di Grezia
$INTC (Intel) $TSM (Taiwan Semiconductor Manufacturing Co Ltd - ADR) $ASML (ASML Holding NV) Hyper NA is coming. www.youtube.com/watch?v=1JkzrR-hznE ASML’s Hyper NA is the next generation of EUV (Extreme Ultraviolet) lithography, featuring a numerical aperture above 0.55, designed to push the boundaries of semiconductor miniaturization. Compared to conventional EUV systems (NA 0.33), Hyper NA enables higher resolution, essential for technology nodes below 2 nanometers. With more advanced optics and innovative projection techniques, it allows finer, denser patterns while reducing the need for multipatterning. However, it also requires new materials, masks, and manufacturing approaches. ASML aims to introduce Hyper NA systems by the end of the decade, further strengthening its leadership in the chipmaking industry.
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